Ucsb Nanofab Etching Recipes
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ICP Etching Recipes - UCSB Nanofab Wiki - UC Santa Barbara
1 week ago ucsb.edu Show details
Si Etching (Fluorine ICP Etcher) 89-90 degree etch angle, ie, vertical. High selectivity to Al2O3 masks. For high aspect ratio Si etching, try ALD Al 2 O 3 (~20-30nm) + SiO 2 (2nm, for PR adhesion) hardmasks followed by Pan2 Al 2 O 3 etch (will go straight through the thin SiO 2 without additional etch time). See more
Stepper Recipes - UCSB Nanofab Wiki - UC Santa Barbara
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Web Stepper 1 and Stepper 2 are i-line systems with good piece handling capabilities. Stepper 3 is a DUV (248nm) system primarily used for full 100mm wafers. DUV resists do not work for i-line and i-line resists do not work for DUV. Based on your sample reflectivity, absorption (or whether or not you use an ARC layer), and surface topography, the ...
Lithography Recipes - UCSB Nanofab Wiki - UC Santa Barbara
1 week ago ucsb.edu Show details
Web 31 rows · May 9, 2024 · Lithography Recipes. Lists all stocked photolith. chemicals, PRs, strippers, developers, and links to the chemical's application notes/datasheet, which detail the spin curves and nominal processes. Starting recipes (spin, bake, exposure, develop etc.) for all photolith. tools. Substrate/surface materials/pattern size can affect process …
Direct-Write Lithography Recipes - UCSB Nanofab Wiki - UC Santa …
2 weeks ago ucsb.edu Show details
Web Used UCSB design. Good for up to ~1.3um open line space. AZnLOF2020: 4 krpm, 30s 110°C, 60s ~ 2.1µm 375 340 - 3 110°C, 60s none: AZ300MIF 90s Used UCSB design. Good for 2um open line space. SU-8 2075 ~70µm 375 Extremely viscous. Pour into a wide-mouthed bottle, dispense directly from bottle. Replace napkin at end. *PEB: post …
ICP Etch 1 (Panasonic E646V) - UCSB Nanofab Wiki - UC Santa …
3 days ago ucsb.edu Show details
Web Feb 7, 2024 · Chamber one "Etch Chamber" is configured as an ICP etching tool with 1000 W ICP power, 500 W RF substrate power, and RT - 80°C operation with back-side He cooling and an electrostatic chuck to maintain controlled surface temperatures during etching. This chamber has the following dedicated gas sources: Cl 2, BCl 3, and O 2.
Cleanroom | UCSB Nanofab
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Web Information on the Nanofab cleanroom, equipment, layout, facilities and semiconductor fabrication tools. ... Starting Recipes and Historical Data on the NanoFab Wiki (Click on a bay to learn more) Litho Bay #2. Litho Bay #1. Acid Bay. ... UC Santa Barbara NanoFabrication Facility. Engineering Sciences Building (Bldg. #225), Santa Barbara, …
Tool List - UCSB Nanofab Wiki - UC Santa Barbara
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Web Mar 1, 2024 · Metrology, Electrical/Optical Testing and Thin-Film/Materials Characterization tools. Optical Microscopy. Optical Microscopes - General Use. Fluorescence Microscope (Olympus MX51) Deep UV Optical Microscope (Olympus) Laser Scanning Confocal M-scope (Olympus LEXT) Digital Microscope #7 (Olympus DSX1000)
UCSB Nanofab Wiki
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Web Mar 12, 2024 · News from the U.C. Santa Barbara Nanofabrication Facility. NanoFab staff awarded Goleta's Innovator of the Year 2023. NanoFab staff member Demis D. John has been awarded the City of Goleta's "Innovator of the Year" for 2023! The award stems from the UCSB Nanofab's impact on the communities of Santa Barbara County and …
UCSB Nanofab: U.C. Santa Barbara Cleanroom: Semiconductor …
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Web The UCSB Nanofab is an open-access semiconductor cleanroom dedicated to making sure your research succeeds. top of page. UC Santa Barbara Nanofabrication Facility. UC . Santa Barbara. Nanofabrication Facility. Bay 4 | metrology. Jump To: ... Santa Barbara, CA 93106. Office Hours. M-F 8am - 5pm.
The Nanofabrication Facility - UCSB College of Engineering
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Web The Nanofab is also heavily used by UCSB researchers. Thibeault once did a study with the UCSB Offi ce of Research and discovered that re-searchers on some 35 percent of all grants at UCSB used the facility in some way. Nanofab leadership has also recently replied to solicitations for funds from the $50 billion-plus
Other Dry Etching Recipes - UCSB Nanofab Wiki
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Web Si Etch Recipe; Vapor HF Etch (uETCH) SiO 2 Etch Recipe 1; SiO 2 Etch Recipe 2; CAIBE (Oxford Ion Mill) Reminder: From now on, one should always use P RF =200W! (see supervisor for explanation) Pt Etch Recipe; Au Etch …
Laser Etch Monitoring - UCSB Nanofab Wiki
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Web Ideally the entire laser spot should fit inside an etched area of your wafer. The exact spot size varies on different systems based on the distance between Wafer and Laser. For the Intellemetrics systems, an open etched area of about 500 µm or larger is generally adequate to line up your laser spot. The larger the easier the alignment will be.
Nanofabrication Facility | UCSB Shared Instrumentation Network
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Web Nanofabrication Facility. Nanotech supports nanofabrication research by providing tools and training for academic institutions, industries, and government agencies. The facility features 12,700 square feet of clean room space to do research using state-of-the-art equipment and offers a wide-range of capabilities.
COE Convergence (S23): "The Nanofab" - ece.ucsb.edu
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Web From the COE/CLS Convergence (S23) magazine article "Tech Edge: The Nanofabrication Facility"; Check out the COE "In Focus" video "The Nanofab: An Innovation Center"; Matthew Wong, a UC Santa Barbara assistant project scientist who earned his PhD with UC Santa Barbara professors Shuji Nakamura and Steven DenBaars, visited numerous …
